Stephen F. Gilmartin
Khalil Arshak
Stephen F. Gilmartin
Damian Collins
Olga Korostynska
Arous Arshak
Patterning Nanometer Resist Features on Planar and Topography Substrates Using The 2-Step NERIME FIB Top Surface Imaging Process.
159-166
2005
conf/icmens/2005
ICMENS
https://doi.org/10.1109/ICMENS.2005.97
https://doi.ieeecomputersociety.org/10.1109/ICMENS.2005.97
db/conf/icmens/icmens2005.html#ArshakGCKA05
Arous Arshak
Khalil Arshak
Damian Collins
Olga Korostynska