Draft:Twinscan

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Twinscan, stylized as TWINSCAN, is a series of photolithography machines built and manufactured by ASML. The first Twinscan lithography machine, the Twinscan AT:750T, was shipped in 2001.[1] Twinscan is the only series of lithography machines to have two wafer stages. Currently, the Twinscan NXE:5000 is the latest lithography machine built by ASML.[2] The NXE line of Twinscan lithography machines is the only production EUV lithography machines in existence, with the compnay having shipped 140 lithography machines as of March 2022.[3] Currently, the biggest customer of the Twinscan lithography machines is Taiwan Semiconductor Manufacturing Co. (TSMC), which owns around 50% of the total EUV lithography of the Twinscan lithography machines.[4] The NXE series of machines are used for the manufacture of sub-10 nm transistor nodes, as traditional Deep Ultra-violet lithography's wavelength of 193 nm does not have enough resolution for it to print the features of a 10 nm transistor.[5]

ASML's EUV machines have experienced significant demand in recent years due to the AI boom and crypto-boom and due to them being the only lithography machines able to produce the most advanced chips.[3]

Comparisons to other lithography machines

Twinscan photolithography machines utilize dual stage wafer tables, which differ from many of the competition designs from Cannon and Nikon. Notably, Twinscan NXE line is currently the only series of lithography machines that are able to use EUV to produce chips. EUV lithography helps to reduce energy consumption by lithography machines and the chips they produce and is why the demand for them is so high.[6][7]

Sources

  1. ^ "TWINSCAN: 20 years of lithography innovation". www.asml.com. Retrieved 2022-12-17.
  2. ^ "ASML Shows Off Next-Generation, $380 Million High-NA EUV Lithography Machines". ExtremeTech. 2024-02-14. Retrieved 2024-12-13.
  3. ^ a b Tarasov, Katie. "ASML is the only company making the $200 million machines needed to print every advanced microchip. Here's an inside look". CNBC. Retrieved 2023-01-19.
  4. ^ "TSMC accounts for half of industry's EUV equipment installation base and wafer production". TechSpot. Retrieved 2023-01-19.
  5. ^ "Deep UV Photolithography". www.newport.com. Archived from the original on 2024-08-28. Retrieved 2024-12-13.
  6. ^ "Innovative EUV lithography technology dramatically increases energy efficiency and reduces capital cost of semiconductor manufacturing". Okinawa Institute of Science and Technology OIST. 2024-07-29. Retrieved 2024-12-13.
  7. ^ "Extreme-Ultraviolet Lithography - an overview | ScienceDirect Topics". www.sciencedirect.com. Retrieved 2024-12-13.